Photonics in Asia

A special issue of Applied Sciences (ISSN 2076-3417). This special issue belongs to the section "Applied Physics General".

Deadline for manuscript submissions: closed (15 May 2020) | Viewed by 4600

Special Issue Editors


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Guest Editor
Institute of Electro-Optical Science and Technology, National Taiwan Normal University, No.88, Sec. 4, Ting-Chou Rd., Taipei 11677, Taiwan
Interests: optoelectronic semiconductor materials and devices; nano-fabrication process; green energy technology
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Guest Editor
Center for Integrated Nanotechnologies (CINT), Los Alamos National Laboratory, Los Alamos, NM 87545, USA
Interests: metamaterials; plasmonics; terahertz science and technology; semiconductor optoelectronics
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

Photonics is a discipline dealing with the generation, manipulation, transportation, and detection of light. The applications of photonics have been widespread due mainly to the rapid development of cutting-edge lasers, fiber optics, high-speed photodetectors, as well as other optoelectronic devices. Specifically, the success of photonics has led to a wide variety of advanced lightwave technologies such as telecommunication and date storage, optical computing and information processing, solid state lighting, 3D-display and imaging, health monitoring, alternative energy, etc.  

In this Special Issue we cordially invite original contributions from authors in the various areas of photonics in Asia. Submission contributions include but are not limited to (1) growth, synthesis and characteristics of photonic micro- and nano-materials; (2) physics, fabrication, and characterization of photonic devices; (3) numerical simulation and modeling; (4) low-dimensional photonic devices and materials; (5) other novel functional photonic materials, structures, and devices and their applications.

Prof. Ya-Ju Lee
Prof. Chun-Chieh Chang
Guest Editors

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Published Papers (1 paper)

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Research

12 pages, 4574 KiB  
Article
Gold Nanofilm-Coated Porous Silicon as Surface-Enhanced Raman Scattering Substrate
by Ibrahim Khalil, Chia-Man Chou, Kun-Lin Tsai, Steven Hsu, Wageeh A. Yehye and Vincent K. S. Hsiao
Appl. Sci. 2019, 9(22), 4806; https://doi.org/10.3390/app9224806 - 10 Nov 2019
Cited by 17 | Viewed by 4197
Abstract
Metallic film-coated porous silicon (PSi) has been reported as a lucrative surface-enhanced Raman scattering (SERS) substrate. The solution-based fabrication process is facile and easy; however, it requires additional reducing agent and extra chemical treatment, as well as hinders the suitability as a reproducible [...] Read more.
Metallic film-coated porous silicon (PSi) has been reported as a lucrative surface-enhanced Raman scattering (SERS) substrate. The solution-based fabrication process is facile and easy; however, it requires additional reducing agent and extra chemical treatment, as well as hinders the suitability as a reproducible SERS substrate due to irregular hot spot generation via irregular deposition of metallic nanocrystallites. To address this issue, we report a unique one-step electronic beam (e-beam) physical vapor deposition (PVD) method to fabricate a consistent layer of gold (Au) nanofilm on PSi. Moreover, to achieve the best output as a SERS substrate, PSi prepared by electrochemical etching was used as template to generate an Au layer of irregular surface, offering the surface roughness feature of the PSi–Au thin film. Furthermore, to investigate the etching role and Au film thickness, Au-nanocrystallites of varying thickness (5, 7, and 10 nm) showing discrete surface morphology were characterized and evaluated for SERS effect using Rhodamine 6G (R6G). The SERS signal of R6G adsorbed on PSi–Au thin film showed a marked enhancement, around three-fold enhancement factor (EF), than the Si–Au thin film. The optimal SERS output was obtained for PSi–Au substrate of 7 nm Au film thickness. This study thus indicates that the SERS enhancement relies on the Au film thickness and the roughness feature of the PSi–Au substrate. Full article
(This article belongs to the Special Issue Photonics in Asia)
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